• Manual Wafer Hot Plate
  • Manual Wafer Hot Plate
  • Manual Wafer Hot Plate
  • Manual Wafer Hot Plate
Manual Wafer Hot Plate
manual wafer hot plate for up to 200mm wafers/substrates has been designed to meet the requirement……

manual wafer hot plate for up to 200mm wafers/substrates has been designed to meet the requirements of R&D work and small scale production and is available in bench mounted, table-top or stand-alone versions.The hot plate is equipped with lift pins as a standard, which permits convenient and safe substrate handling. Nitrogen purge and vacuum suction of the substrate can also be individually selected for each step in the recipe editor.

manual wafer hot plate

The closed double walled lid ensures stable process conditions and prevents accidental touching of the hot surface by the operator.

  hot plate Product Features

1.13.875 in (354.24 mm) diameter heater surface,Milled flat plate aluminum ideal for 12 in (304.8 mm) or smaller silicon wafers

2.Controllable remotely from a PC or industrial controller via RS232 I/O port or via the Remote Controller Provided with full access to all parameters or data.Bench top controllable and programmable using the remote controller provided

3.Temperature range from room temperature to 350 °C.

4.Readable and settable to 0.1 °C,Accuracy 1% of setting

5.Temperature stability ± 1 °C,Uniformity of temperature from the middle of the plate surface to within 0.75 in of the sides is better than 1%.Calibrated to 0.1 °C for guaranteed accuracy

Heating plate module

Heating plate module

6.Remote controller enables storing 5 individual programs with up to 10 steps per program for a variety of hands-off, repeatable sample runs

7.Programs automatically repeatable from 1 to 99 times or infinitely if wanted

8.Ramp temperatures up or down at 1 °C/hour increments from 1 °C to 450 °C

9.1800 W heater power

10.Built-in count down timer with audible alarm and settable Auto-Off

11.Compact dimension, can put in vacuum glove box

Hotplates

Specifications

Temperature
Platinum RTD 100 Ω at zero mounted in the heater top
Range 10 °C to 350 °C on the plate surface
Readability 1 °C
Temperature control type PID
Temperature stability 1 °C
Temperature Uniformity Better than 1% of setting from center to within 0.75” of plate edge
Electrical
Heater power 1500 W
VAC 115 VAC, 50/60 Hz (230 VAC available upon request)
Fused Yes
Line Cord Detachable, 6 ft (1.8 m), 3-wire grounded. Single phase
Dimensions: Heater Module
Width 480 mm
Height 380mm
Weight 35kg

Hot Plate User Interface

  Applications

Cleaning silicon wafers

Drying silicon wafers

Etching silicon wafers

Heat testing circuits

Heat testing epoxies

Soldering surface mount PCB’s

Life cycle testing of PCB’s

Testing LCD’s

wafer hot plate Applications

Utilities

• voltage ranges: 100-120; 208-230 VAC

• power requirements:1800W (16.4A); 1800W (8.1A) max

• exhaust port: 2” OD

• vacuum:<33kPa abs

• exhaus: 5-10cfm

• N2:35psi

N2 Nitrogen purge Lift pins Proximity bake

 


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Manual Wafer Hot Plate

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Foreign trade cattle is based on the premise of big data analysis

Manual Wafer Hot Plate

24-hour service

Foreign trade cattle is based on the premise of big data analysis

Manual Wafer Hot Plate

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